Acquisition Of An Induction-Generated Plasma-Assisted Deposition Machine And Its Installation In The Ietr Gas Network And Acquisition Of A Spectrophotometer (Cper Cymocod Phase 4B)

  Address - France

  Contact details - 565656565

  Tender notice no. - 76454545

  GT Ref Id - 102232140

  Document Type - Tender Notices

Description - Description: As part of phase 4 of the project, NanoRennes plans to equip itself with a PECVD (Plasma Enhanced Chemical Vapor Deposition) reactor. This equipment will make it possible to deposit thin layers of electronic quality on rigid or flexible substrates and in particular on new polymers from bio-sourced syntheses that could eventually replace substrates such as kapton, PEN PET, etc. in some cases. This equipment will reinforce the IETR's positioning at the forefront of flexible electronics manufacturing technologies and, more particularly, on electronic circuits using bio-sourced substrates and materials to reduce the environmental impact of semiconductor device manufacturing.local ti

Gt Ref Id - 102232140

Deadline - Feb 27, 2025