Most trusted source for Tendering Opportunities and Business Intelligence since 2002
Most trusted source for Tendering Opportunities and Business Intelligence since 2002
Country - Switzerland
Summary - Icp3 Ion Etching System First Eth Zurich
Deadline - Nov 14, 2024
GT reference number - 95031932
Product classification - Laboratory, optical and precision equipments (excl. glasses)
Address - Switzerland
Contact details - 565656565
Tender notice no. - 76454545
GT Ref Id - 95031932
Document Type - Tender Notices
Description - Description: Delivery of a reactive ion etching system with inductively coupled plasma, consisting of a gas supply system for at least 9 gases, with process pressure up to 100 mtorr and gas flows up to 500 sccm, RF/ICP generators in the kW range with autotuning, spectroscopic monitoring of the plasma, automatic loading lock for fast loading, for sample sizes from 4 inches in diameter, with sample temperature control in the range from 10 to 300 °C.notice_title: Icp3 Ion Etching System First Eth ZurichContract Type: : Goodslocal description: : Lieferung einer reaktiven Ionenätzanlage mit induktiv gekoppeltem Plasma, bestehend aus einem Gasversorgungssystem für mindestens 9 Gase, mit Prozess
Gt Ref Id - 95031932
Deadline - Nov 14, 2024
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