Icpcvd Coating System

  Address - Germany

  Contact details - 565656565

  Tender notice no. - 76454545

  GT Ref Id - 99964258

  Document Type - Tender Notices

Description - Description: A system for chemical vapor deposition using inductively coupled plasma (ICP-CVD) is being advertised. The system is to be a core part of the wafer processing infrastructure and will be installed in the clean room of the University of Pa derborn. The development of wafer-scale components places great demands on the wafer size (up to 8 inches), the structure size and the structure homogeneity. The layers deposited using the system at low deposition pressures and temperatures (?20°C) should be of high quality with little damage and high wet-chemical etching resistance and should have high conformity and step coverage. The layers to be deposited should include SiO2, Si3N4, SiOxNy,

Gt Ref Id - 99964258

Deadline - Jan 16, 2025