Ion Mill Chamber With Central Handling System And 2 Pvd Chambers (Enas-01.1) (Pr880932-3340-P)

  Address - Germany

  Contact details - 565656565

  Tender notice no. - 76454545

  GT Ref Id - 105584179

  Document Type - Tender Notices

Description - Description: Description: 1x wafer processing system with a central handling system, 1 chamber for ion rays and 1 PVD chamber for in-situ passenevation and electrode separation. The system is to edit 200 mm wafer. The chamber of ion beams must be sui table for the structuring of magnetic multi -tapes (GMR, TMR). Furthermore, this chamber must be equipped with an optical emission spectrometer (OES) for endpoint detection. The PVD chamber is used to separate SIN passivation layers on the GMR/TME structures immediately after structuring without vacuum interruption and to separate electrode systems from precious metals.Optional features:- Replacement set of chamber parts (shielding / shutter), wh

Gt Ref Id - 105584179

Deadline - Apr 22, 2025