Supply And Commissioning Of An Inductively Coupled Plasma Etcher

  Address - United Kingdom

  Contact details - 565656565

  Tender notice no. - 76454545

  GT Ref Id - 105805134

  Document Type - Tender Notices

Description - Description: An Inductively Coupled Plasma Etcher is sought to process semiconductor materials such as (but not limited to) Gallium Nitride and Silicon. The ideal system will be deployed for academic research and located within a cleanroom micro-fabr ication facility.II.1.6) The Institute of Photonics is seeking to complement their cleanroom micro-fabrication facility equipment with an Inductively Coupled Plasma Etcher. The system will be used to process semiconductor materials typically (but not limited to) Gallium Nitride (GaN) and Silicon (Si) passive and active devices. The system will be employed for academic research. It is purposed to bring extra capability to already existing assets.T

Gt Ref Id - 105805134

Deadline - Mar 26, 2026