Supply And Installation Of Automatic Equipment For 200Mm Ion Beam Engraving Plates

  Address - France

  Contact details - 565656565

  Tender notice no. - 76454545

  GT Ref Id - 83515523

  Document Type - Tender Notices

Description - Description: CEA Leti wishes to acquire automatic equipment for 200mm ion beam etching plates with a nitrided silicon deposition solution (optional)The ion beam etch chamber must be capable of performing reactive ion beam etch (RIBE) and chemically a ssisted ion beam etch (CAIBE) with argon, oxygen, fluorine and of chlorine.The equipment must process different types of 200 mm wafers (bonded, silicon on glass or silicon on silicon) and of varying thicknesses (from 500 to 1500 um).local title:: Fourniture et installation d’un équipement automatique pour plaques 200mm de gravure par faisceau d'ionstype_of_procedure: Negotiated without prior call for competition

Gt Ref Id - 83515523

Deadline - Jul 29, 2024