Name: supply of Plasma Cleaner and vacuum pump and guage
Start: 2023-09-13
End: 2023-09-21
Location: CENTRE FOR CELLULAR AND MOLECULAR PLATFORMS (C-CAMP)

Organization Details:

Organization Name:

CENTRE FOR CELLULAR AND MOLECULAR PLATFORMS (C-CAMP)

Country:

India

Contact Person:

Address:

GKVK,
Bellary Road,
Bangalore 560065
Karnataka KARNATAKA,

Contact Details - Email:

Phone

+91-80-23666344

Notice Details:

Notice Type

Tender Notice

Bidding Type

Other

Notice No.

71593269

Deadline

2023-09-21

Description

Centre for Cellular and Molecular Platforms
Ref: C-CAMP/L-O85/2O23-24 (C)
Dear Sirs,
ENQUIRY
.September 04, 2023
81.No.
Please let US have your lowest quotation for the following:
Item/s description
Qty•
Technical Specification for Plasma Cleaner
01
Application: Plasma cleaners are inductively coupled plasma devices that are used for surface cleaning, surface preparation, and surface modification. The plasma cleaner will be used for the fabrication of PDMS microfluidic devices, where the plasma removes organic contamination and activates the PDMS surface in preparation for bonding with glass, PDMS or other similarly treated surfaces. Without this instrument, the end-to-end development of PDMS-based microfluidics will be incomplete and impossible. Hence, it is sought for purchase.
General Specifications: In general, the plasma cleaner should be portable, bench-top, have provisions to work with at least two process gases (air and oxygen), accommodate minimum 4” wafers (with a wafer carrier), and have a vacuum-pump with a pressure gaugc/display.
Specific Requirements:
Form Factor: Compact, tabletop model is preferred with weight < 20 kg
Physical dimensions: Height < 15"; Width < 201: Depth < 10""
Power Settings: Must work on RF power (at least 25 W).
RF power should be adjustable (High, Medium, Low).
Process Gases: Must have provision for working with at least two process gases, preferably AirandOxveen.Metering valves must be present to release the vacuum.
Sample Sizes: Should accommodate standard microscopic glass slides (75 mm X 25 mm) as well as PDMS substrates of similar dimensions.
Must also accommodate 4” Si wafers (101 mm). However, since the wafers will likely be placed in a round wafer carrier, the chamber diameter of the plasma cleaner should be at least 110 mm. 6٤" chamber diameter is most preferable so that some flexibility is offered. This requirement is non-ncgotiablc.
Must have viewing window for checking plasma generation.
Vacuum Pump: Oil-based vacuum pump is sufficient. Tray for accidental oil leaks must be provided in this case.
The pump must be controllable from the main body of the plasma cleaner.
Minimum pump speed > 20 Un.
Total pressure 6200 mTorr.
Pressure Gauge/Display:
Monitoring vacuum pressure is useful for process repeatability and hence the machine must be provided with a vacuum gauge with digital display to get a sense of the vacuum pressure generated. Should be able to monitor pressure as low as 1 mTorr.
General
Safety: The machine is supposed to have internal safety standards. Should have all safety mechanisms in place.
Reliability: The machine must be a reliable work horse with minimum down-time and easy availability of spare parts if required.
١Varranty:The manufacturer or supplier needs to provide a stipulated warranty on the machine and all appropriate components.

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